Yıl: 2022 Cilt: 10 Sayı: 4 Sayfa Aralığı: 1026 - 1036 Metin Dili: İngilizce DOI: 10.29109/gujsc.1137863 İndeks Tarihi: 23-03-2023

The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing

Öz:
Impact of annealing on structural, morphological, elemental, electrical, and optical properties of bilayer ZnO/Al2O3 films has been investigated. Bilayer films have been deposited on microscope slides by ultrasonic spray pyrolysis method at 350°C substrate temperature. Then, those films have been annealed at 400°C, 500°C, and 600°C under atmospheric conditions, respectively. Structural analysis has revealed that bilayer films have polycrystalline with hexagonal wurtzite structures of ZnO. Also, there is no other structures have been found like Zn-Al, etc. Morphological and elemental analyses have been presented that the alterations of surface, and diffusions of Al to ZnO layer. Cross-sectional images have revealed the film thicknesses are between 0.78-1.56 m. Resistivity values of the films have been obtained between 6.78x101 ohm- cm to 3.29 x101 ohm-cm. Optical method has been used for the calculation of optical band gap values of the films which are found between 3.17-3.25 eV. The results have revealed that annealing leads to diffusion from the bottom layer of Al2O3 of the material to the upper layer, ZnO. In addition, the properties of ZnO/Al2O3 films are still the focus of researchers.
Anahtar Kelime: ZnO Al2O3 bilayer films spray pyrolysis thermal annealing characterization

Belge Türü: Makale Makale Türü: Araştırma Makalesi Erişim Türü: Erişime Açık
  • [1] Rowlette, P. C., Wolden, C. A., Pulsed plasma-enhanced chemical vapor deposition of Al2O3–TiO2 nanolaminates, Thin Solid Films, 518(3337-3341), (2010).
  • [2] Khan, M. I., Imran, S., Saleem, M., Rehman, S. U., Annealing effect on the structural, morphological and electrical properties of TiO2/ZnO bilayer thin films. Results in physics, 8(249-252), (2018).
  • [3] Besleaga, C., Stan, G. E., Galca, A. C., Ion, L., Antohe, S., Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate. Applied surface science, 258(8819-8824) (2012).
  • [4] Yadav, H. M., and Kim, J. S., Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties. Journal of Materials Science: Materials in Electronics, 27(10082-10088) (2016).
  • [5] Lin, C. Y., Chen, J. G., Feng, W. Y., Lin, C. W., Huang, J. W., Tunney, J. J., Ho, K. C., Using a TiO2/ZnO double-layer film for improving the sensing performance of ZnO based NO gas sensor. Sensors and Actuators B: Chemical, 157(361-367) (2011).
  • [6] Ding, K., Zhang, X., Ning, L., Shao, Z., Xiao, P., Ho-Baillie, A., ... and Jie, J., Hue tunable, high color saturation and high-efficiency graphene/silicon heterojunction solar cells with MgF2/ZnS double anti-reflection layer. Nano Energy, 46(257-265), (2018).
  • [7] Kanda, H., Uzum, A., Harano, N., Yoshinaga, S., Ishikawa, Y., Uraoka, Y., ... and Ito, S., Al2O3/TiO2 double layer anti reflection coating film for crystalline silicon solar cells formed by spray pyrolysis. Energy Science & Engineering, 4(269-276), (2016).
  • [8] Mahadik, M. A., Shinde, S. S., Mohite, V. S., Kumbhar, S. S., Moholkar, A. V., Rajpure, K. Y., ... and Bhosale, C. H., Visible light catalysis of rhodamine B using nanostructured Fe2O3, TiO2 and TiO2/Fe2O3 thin films. Journal of Photochemistry and Photobiology B: Biology, 133(90-98), (2014).
  • [9] Polyakov, B., Kuzmin, A., Vlassov, S., Butanovs, E., Zideluns, J., Butikova, J., ... and Zubkins, M., A comparative study of heterostructured CuO/CuWO4 nanowires and thin films. Journal of Crystal Growth, 480 (78-84), (2017).
  • [10] Viter, R., Iatsunskyi, I., Fedorenko, V., Tumenas, S., Balevicius, Z., Ramanavicius, A., ... and Bechelany, M., Enhancement of electronic and optical properties of ZnO/Al2O3 nanolaminate coated electrospun nanofibers. The Journal of Physical Chemistry C, 120(5124-5132), (2016).
  • [11] Elam, J. W., Sechrist, Z. A., George, S. M., ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements, Thin Solid Films, 414(43-55), (2002).
  • [12] Martínez-Castelo, J. R., López, J., Domínguez, D., Murillo, E., Machorro, R., Borbón-Nuñez, H. A., ... and Tiznado, H., Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition. Materials Science in Semiconductor Processing, 71 (290-295), (2017).
  • [13] Ahn, C. H., Kim, S. H., Kim, Y. K., Lee, H. S., and Cho, H. K., Effect of post-annealing temperatures on thin-film transistors with ZnO/Al2O3 superlattice channels. Thin Solid Films, 584 (336-340) (2015).
  • [14] Tüzemen, E. Ş., Özer, A., Demir, İ., Altuntaş, İ., Şimşir, M., ZnO/Al2O3 layered structures deposited by RF magnetron sputtering on glass: growth characteristics, optical properties, and microstructural analysis. Journal of the Australian Ceramic Society, 57(1379-1388) (2021).
  • [15] Zahid, M. A., Khokhar, M. Q., Park, S., Hussain, S. Q., Kim, Y., and Yi, J., Influence of Al2O3/IZO double-layer antireflective coating on the front side of rear emitter silicon heterojunction solar cell. Vacuum, 200(110967), (2022).
  • [16] Purica, M., Budianu, E., Rusu, E., Danila, M. A., and Gavrila, R., Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD). Thin Solid Films, 403(485-488), (2002).
  • [17] Di Mauro, A., Fragala, M. E., Privitera, V., and Impellizzeri, G., ZnO for application in photocatalysis: From thin films to nanostructures. Materials Science in Semiconductor Processing, 69(44-51), (2017).
  • [18] Kaneva, N. V., Dushkin, C. D., Preparation of nanocrystalline thin films of ZnO by sol-gel dip coating. Bulg Chem Commun, 43(259-263), (2011).
  • [19] Polat Gönüllü, M. The Effect of Annealing Technique on ZnO Film Properties. Gazi University Journal of Science, 35(618-629), (2022).
  • [20] Pradhan, S. K., Reucroft, P. J., Ko, Y., Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition. Surface and Coatings Technology, 176(382-384), (2004).
  • [21] Nalcaci, B., Polat Gonullu, M., Insight of mechanical and morphological properties of ALD-Al2O3 films in point of structural properties. Applied Physics A, 127(1-10) (2021).
  • [22] Ateş, H., Polat Gonullu, M., Atomik Katman Biriktirme Tekniğine Genel Bakış: ZnO, TiO2 ve Al2O3 Filmlerin Üretimi. Gazi University Journal of Science Part C: Design and Technology, 7/3 (649-660) (2019).
  • [23] Khazamipour, N., Kabiri-Ameri-Aboutorabi, S., Asl-Solaimani, E., The structural, electrical and optical properties of ZnO/Al2O3 multilayer deposited on PET substrates by RF sputtering. Renewable energy, 49(275-277), (2013).
  • [24] Cui, G., Han, D., Dong, J., Cong, Y., Zhang, X., Li, H., ... and Wang, Y., Effects of channel structure consisting of ZnO/Al2O3 multilayers on thin-film transistors fabricated by atomic layer deposition. Japanese Journal of Applied Physics, 56(4S), (2017) 04CG03.
  • [25] Chaaya, A. A., Viter, R., Baleviciute, I., Bechelany, M., Ramanavicius, A., Gertnere, Z., ... and Miele, P., Tuning optical properties of Al2O3/ZnO nanolaminates synthesized by atomic layer deposition. The Journal of Physical Chemistry C, 118(3811-3819), (2014).
  • [26] Gonullu, M. P., Design and characterization of single bilayer ZnO/Al2O3 film by ultrasonically spray pyrolysis and its application in photocatalysis. Superlattices and Microstructures, 164(107113), (2022).
  • [27] Patil, P. S., Versatility of chemical spray pyrolysis technique. Materials Chemistry and physics, 59(185-198), (1999).
  • [28] Gonullu, M. P., Kose, S., On the Role of High Amounts of Mn Element in CdS Structure. Metallurgical and Materials Transactions A, 48(1321-1329), (2017).
  • [29] Khan, M. I., Ali, A., Effect of laser irradiation on the structural, morphological and electrical properties of polycrystalline TiO2 thin films. Results in physics, 7(3455-3458), (2017).
  • [30] Garnier, J., Bouteville, A., Hamilton, J., Pemble, M. E., Povey, I. M., A comparison of different spray chemical vapour deposition methods for the production of undoped ZnO thin films. Thin Solid Films, 518(1129-1135), (2009).
  • [31] Bacaksiz, E., Parlak, M., Tomakin, M., Özçelik, A., Karakiz, M., Altunbaş, M., The effects of zinc nitrate, zinc acetate and zinc chloride precursors on investigation of structural and optical properties of ZnO thin films. Journal of Alloys and Compounds, 466(447-450), (2008).
  • [32] Jakschik, S., Schroeder, U., Hecht, T., Gutsche, M., Seidl, H., and Bartha, J. W., Crystallization behavior of thin ALD-Al2O3 films. Thin Solid Films, 425(216-220), (2003).
  • [33] Barrett, C. S., CS, B., and TB, M., Structure of metals, Crystallographic methods, principles and data, (1980).
  • [34] Callister, W. D., and Rethwisch, D. G., Materials science and engineering: an introduction (Vol. 9). (2018), New York: Wiley.
  • [35] Mamazza Jr, R., Morel, D. L., and Ferekides, C. S., Transparent conducting oxide thin films of Cd2SnO4 prepared by RF magnetron co-sputtering of the constituent binary oxides. Thin solid films, 484(26-33), (2005).
  • [36] Sutanto, H., Durri, S., Wibowo, S., Hadiyanto, H., Hidayanto, E., Rootlike morphology of ZnO:Al thin film deposited on amorphous glass substrate by sol-gel method. Physics Research International, 2016: 1-7, (2016).
  • [37] Navin, K. and Kurchania, R., Structural, Morphological and Optical Studies of Ripple Structured ZnO Thin Films. Applied Physics A: Materials Science and Processing, 121: 1155- 1161, (2015).
  • [38] Kwon, S. J. Park, J. H., Park, J. G., Wrinkling of sol–gel-derived thin Film. Physical Review E 71: 011604, (2005).
  • [39] Scherer, G. W., Sintering of sol–gel films. Journal of Sol-Gel Science and Technology 8(1): 353-363, (1997).
  • [40] Khazamipour, N., Kabiri-Ameri-Aboutorabi, S., Asl-Solaimani, E., The structural, electrical and optical properties of ZnO/Al2O3 multilayer deposited on PET substrates by RF sputtering. Renewable energy, 49, 275-27, (2013).
  • [41] Ahn, C. H., Kim, S. H., Kim, Y. K., Lee, H. S., Cho, H. K., Effect of post-annealing temperatures on thin-film transistors with ZnO/Al2O3 superlattice channels. Thin Solid Films, 584, 336-340, (2015).
  • [42] Choi, D. W., Kim, S. J., Lee, J. H., Chung, K. B., Park, J. S., A study of thin film encapsulation on polymer substrate using low temperature hybrid ZnO/Al2O3 layers atomic layer deposition. Current Applied Physics, 12, S19-S23, (2012).
  • [43] Huafu, Z., Hanfa, L., Aiping, Z., Changkun, Y., Influence of the distance between target and substrate on the properties of transparent conducting Al–Zr co-doped zinc oxide thin films. Journal of semiconductors, 30(11), 113002, (2009).
  • [44] Lu, J. G., Ye, Z. Z., Zeng, Y. J., Zhu, L. P., Wang, L., Yuan, J., Liang, Q. L., Structural, optical, and electrical properties of (Zn, Al) O films over a wide range of compositions. Journal of Applied Physics, 100(7), 073714, (2006).
APA POLAT GONÜLLÜ M, ÇAKIL D, Cetinkaya C (2022). The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. , 1026 - 1036. 10.29109/gujsc.1137863
Chicago POLAT GONÜLLÜ MERYEM,ÇAKIL Damla Dilara,Cetinkaya Cemil The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. (2022): 1026 - 1036. 10.29109/gujsc.1137863
MLA POLAT GONÜLLÜ MERYEM,ÇAKIL Damla Dilara,Cetinkaya Cemil The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. , 2022, ss.1026 - 1036. 10.29109/gujsc.1137863
AMA POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. . 2022; 1026 - 1036. 10.29109/gujsc.1137863
Vancouver POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. . 2022; 1026 - 1036. 10.29109/gujsc.1137863
IEEE POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C "The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing." , ss.1026 - 1036, 2022. 10.29109/gujsc.1137863
ISNAD POLAT GONÜLLÜ, MERYEM vd. "The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing". (2022), 1026-1036. https://doi.org/10.29109/gujsc.1137863
APA POLAT GONÜLLÜ M, ÇAKIL D, Cetinkaya C (2022). The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji, 10(4), 1026 - 1036. 10.29109/gujsc.1137863
Chicago POLAT GONÜLLÜ MERYEM,ÇAKIL Damla Dilara,Cetinkaya Cemil The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji 10, no.4 (2022): 1026 - 1036. 10.29109/gujsc.1137863
MLA POLAT GONÜLLÜ MERYEM,ÇAKIL Damla Dilara,Cetinkaya Cemil The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji, vol.10, no.4, 2022, ss.1026 - 1036. 10.29109/gujsc.1137863
AMA POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji. 2022; 10(4): 1026 - 1036. 10.29109/gujsc.1137863
Vancouver POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing. Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji. 2022; 10(4): 1026 - 1036. 10.29109/gujsc.1137863
IEEE POLAT GONÜLLÜ M,ÇAKIL D,Cetinkaya C "The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing." Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji, 10, ss.1026 - 1036, 2022. 10.29109/gujsc.1137863
ISNAD POLAT GONÜLLÜ, MERYEM vd. "The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis under Thermal Annealing". Gazi Üniversitesi Fen Bilimleri Dergisi Part C: Tasarım ve Teknoloji 10/4 (2022), 1026-1036. https://doi.org/10.29109/gujsc.1137863