Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering
Yıl: 2020 Cilt: 41 Sayı: 4 Sayfa Aralığı: 929 - 937 Metin Dili: İngilizce DOI: 10.17776/csj.780730 İndeks Tarihi: 02-11-2021
Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering
Öz: In the present work, Gallium Oxide (Ga2O3) were deposited as thin films by radio frequency(RF) magnetron sputtering at 300 °C substrate temperature on glass substrate using Ga2O3target with 99.99% purity. The crystalline structure, morphology, optical properties of theGallium Oxide films were determined using X-ray diffraction (XRD), scanning electronmicroscopy (SEM) and UV–Visible Spectrometry, respectively. Experimental results showthat annealing has an important role in the changes observed in the characterization of theGallium Oxide thin films. All thin films produced were amorphous, except for the annealedP4-500. SEM pictures reveal the morphology of prepared Gallium Oxide thin films. Therefractive index and real part of complex dielectric constant increased as the film depositionpressure increased
Anahtar Kelime: Belge Türü: Makale Makale Türü: Araştırma Makalesi Erişim Türü: Erişime Açık
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| APA | MOBTAKERI S, Senadim Tuzemen E, özer a, Gür E (2020). Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. , 929 - 937. 10.17776/csj.780730 |
| Chicago | MOBTAKERI Soheil,Senadim Tuzemen Ebru,özer ali,Gür Emre Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. (2020): 929 - 937. 10.17776/csj.780730 |
| MLA | MOBTAKERI Soheil,Senadim Tuzemen Ebru,özer ali,Gür Emre Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. , 2020, ss.929 - 937. 10.17776/csj.780730 |
| AMA | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. . 2020; 929 - 937. 10.17776/csj.780730 |
| Vancouver | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. . 2020; 929 - 937. 10.17776/csj.780730 |
| IEEE | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E "Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering." , ss.929 - 937, 2020. 10.17776/csj.780730 |
| ISNAD | MOBTAKERI, Soheil vd. "Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering". (2020), 929-937. https://doi.org/10.17776/csj.780730 |
| APA | MOBTAKERI S, Senadim Tuzemen E, özer a, Gür E (2020). Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal, 41(4), 929 - 937. 10.17776/csj.780730 |
| Chicago | MOBTAKERI Soheil,Senadim Tuzemen Ebru,özer ali,Gür Emre Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal 41, no.4 (2020): 929 - 937. 10.17776/csj.780730 |
| MLA | MOBTAKERI Soheil,Senadim Tuzemen Ebru,özer ali,Gür Emre Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal, vol.41, no.4, 2020, ss.929 - 937. 10.17776/csj.780730 |
| AMA | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal. 2020; 41(4): 929 - 937. 10.17776/csj.780730 |
| Vancouver | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering. Cumhuriyet Science Journal. 2020; 41(4): 929 - 937. 10.17776/csj.780730 |
| IEEE | MOBTAKERI S,Senadim Tuzemen E,özer a,Gür E "Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering." Cumhuriyet Science Journal, 41, ss.929 - 937, 2020. 10.17776/csj.780730 |
| ISNAD | MOBTAKERI, Soheil vd. "Characterization of gallium oxide/glass thin films grown by RF magnetron sputtering". Cumhuriyet Science Journal 41/4 (2020), 929-937. https://doi.org/10.17776/csj.780730 |
